Modeling of chemical vapor deposition for growth of thin films

Abstract

Mostofthetasksthatareassociatedwithmanyaspectsofnanotechnologydevelopment are essentially interdisciplinary by its nature. One of the most striking example is the use of gas-phase synthesis problems in nanotechnology. In essence, these technologies are the realization of the processes of the solid state chemical deposition from gaseous substance supplied to the reaction zone. A classic experiment in the learning process has shown its weakness: not clear; does not allowtostudythedependenceofthefinalmaterialcharacteristicsfromthedifferentphysical parameters of the system; time consuming and expensive. By these reasons experiment was replaced by a virtual experiment i.e. simulation. At the base of the work lies the development and testing of mathematical models using high-performance computing in the processes of gas-phase synthesis of nanostructures and nanomaterials in order to study and provide visualization of proceeding physical and chemical processes.